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Handbook of Chemical Vapor Deposition, Second Edition

Handbook of Chemical Vapor DepositionAuthor: Hugh Pierson
Category: Microelectronics
Audience: Completely up-to-date look at the entire chemical vapor deposition process, for engineers and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, filter and other industries.

Table of content (PDF)

Language: en
Copyright: 1999
Pages: 482
6 x 9, Hardcover
ISBN: 0-8155-1432-8


Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope.

Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.


List price: 157,00 US$
Please ask for recent prices in Euro and shipping costs.

  • Practical approach in the handbook stresses CVD use in industry, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters, and many others.
  • Coverage of the chemistry and deposition techniques of new materials produced by CVD as been greatly expanded in the book.
  • Special focus on the rapid growth of two major CVD processes: plasma CVD and metallo-organic CVD.
  • Emphasizes the broad expansion of the use of CVD processes in todays industry, showing the reasons for the growth and the different applications that have developed in the last few years.
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